Physical Vapour Deposition Coatings | PVD Coatings | Titanium Nitride Coatings | Nitride Coatings
4.1 هزار بار بازدید -
7 سال پیش
-
In the PVD deposition technique,
In the PVD deposition technique, a coating material (e.g Ti, Cr, Al) is evaporated under vacuum
Either by heat (thermal evaporation) or by bombardment with ions (sputtering)
At temperatures between 93 and 500 °C.
A reactive gas (e.g. nitrogen or a gas containing carbon) is introduced; it forms a compound with the metal vapor and is deposited on the tools or components
A thin, highly adherent, uniform coating thickness is obtained
It is a line-of-sight process
It require substrate rotation to obtain homogeneous and uniform coatings.
It is difficult to coat complex features such as undercuts, slits and cavities
Coating can be applied typically at a rate of a few millimetres or less per hour.
Average coating thicknesses of 2-5 µm.
The PVD coating process has been successful in a wider range of substrates and application
No post heat treatment of substrate is required after coating due to a low process temperature.
Either by heat (thermal evaporation) or by bombardment with ions (sputtering)
At temperatures between 93 and 500 °C.
A reactive gas (e.g. nitrogen or a gas containing carbon) is introduced; it forms a compound with the metal vapor and is deposited on the tools or components
A thin, highly adherent, uniform coating thickness is obtained
It is a line-of-sight process
It require substrate rotation to obtain homogeneous and uniform coatings.
It is difficult to coat complex features such as undercuts, slits and cavities
Coating can be applied typically at a rate of a few millimetres or less per hour.
Average coating thicknesses of 2-5 µm.
The PVD coating process has been successful in a wider range of substrates and application
No post heat treatment of substrate is required after coating due to a low process temperature.
7 سال پیش
در تاریخ 1396/05/15 منتشر شده
است.
4,126
بـار بازدید شده