Solmates pulsed laser deposition technology introduction (new 2021 industrial design)

#Solmates #PLD #PVD

Solmates' thin film process equipment is based on pulsed laser deposition (PLD). PLD is a Physical Vapour Deposition (PVD) process that offers many advantages above other conventional techniques, like the one-to-one transfer of elements from target to substrate, the ultra low damage to substrates, low temperature growth and excellent control of density. PLD can be compared with Sputtering, only that the plasma is generated by a UV laser irradiation instead of Argon ion bombardment.

PLD has been used for deposition on small scale samples (10 x 10 mm) since 1961. Since then many unique processes were developed but never on wafer scale. Solmates developed PLD equipment for wafers up to 200mm that matches industrial standards. Solmates owns patents on critical aspects of revolutionary PLD technology as well as on specific processes.

Solmates' PLD technology is suitable to deposit many different materials, as can be seen on https://solmates.nl/25/technology.html Selected processes have been optimized for specific markets.