samadii/plasma: Reactive Ion-Etching(RIE) simulation (CUDA)
3.5 هزار بار بازدید -
4 سال پیش
-
Reactive Ion Etching (RIE) is
Reactive Ion Etching (RIE) is a plasma etching technique for micro and nano-structure manufacturing. Volatile compounds are produced during RIE etching processes in the interaction of the sample surfaces and high-energy ions/radicals created by low-pressure plasma.
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4 سال پیش
در تاریخ 1399/03/12 منتشر شده
است.
3,521
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