Pulse Laser Deposition (PLD) (Animation Explainer) @PhysicsMaterialsScienceandNano
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Pulsed laser deposition is a
Pulsed laser deposition is a physical vapor deposition technique in which a high-energy laser is focused on a target material in a vacuum chamber and converted to a plasma plume, which is deposited on a substrate . The deposition can be assisted by a flow of oxygen or other background gases, or occur under ultra-high vacuum conditions.While the equipment needed to perform the deposition in this manner is roughly similar to other deposition methods (such as sputtering), the physical interaction between the laser beam and the target material and the formation of the thin film is very complex. Absorption of laser pulse energy by the target causes electron excitations, which can convert to thermal, chemical, and mechanical energy and evaporation of the target material. The evaporated energetic particles, including atoms, molecules, ions, and electrons can form a plasma plume that will be deposited on the substrate. The precise mechanism of the PLD process is complex, including the process of target material ablation by laser irradiation, the creation of plasma plumes with energetic ions, electrons, atoms, molecules, and charge-free particles, and the process of crystalline growth on the substrate.
Pulsed Laser Deposition (PLD) Process
The pulsed laser deposition process can be divided into four steps, each having a significant impact on the crystallinity, uniformity, and stoichiometry of the created thin film (Read more about Thickness Uniformity).
Absorption of the laser on the target surface and interaction with the material, ablation, and plasma formation
Plasma dynamics and laser-plume interactions
Deposition of the material separated from the target on the substrate.
Nucleation and growth of a thin film of the material on the substrate surface
Pulsed Laser Deposition (PLD) Process
The pulsed laser deposition process can be divided into four steps, each having a significant impact on the crystallinity, uniformity, and stoichiometry of the created thin film (Read more about Thickness Uniformity).
Absorption of the laser on the target surface and interaction with the material, ablation, and plasma formation
Plasma dynamics and laser-plume interactions
Deposition of the material separated from the target on the substrate.
Nucleation and growth of a thin film of the material on the substrate surface
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